مولد كهرباء

UHV deposition system Ebeam-sputter

UHV deposition system (ebeam sputter)



UHV deposition system:

Was used for deposition Titanium - Gold (ebeam)
Ebeam deposition unit is removed
Cryopump and prepump is removed
Loadlock:
for samples round 75mm
Incl. sample heater
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450l/s turbomolecular pump (Leybold)
Proceschamber:
Size: Width 680mm x Height 750mm x Depth 590mm
Incl. shielding
Double oring door (partially pumped)
Heaters
Basepressure low 10-7mbar, high 10-8mbar
Electronics:
Baseline cabinet (e-beam unit removed)
Old PLC (for pump/vent)
Gas cabinet/water:
Various valves/flow reducers for gas and water


Note: D&M Vacuumsystems can upgrade the system to new processes (E-beam or Sputter) incl. new electronics and software.



EUR 55.000,-

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